CMI has three e-beam writers in-house, available write grids are 25nm (i.e. 25 nanometer), 50nm, and 100nm. For good throughput and still very high gray scale resolution, HEBS-glass gray scale masks are written with a minimum gray pixel size of 100nm (i.e. 0.1 micron). Within a 5"x5" pattern area, each of the gray pixels may have an optical density value or a transmittance value selected from more than 500 gray levels.

See how easily you can design your own microlens arrays and tapered structures using HEBS-glass technology by reading page 7 and 8 of CMI Product Information No. 01-88.

Numerous HEBS glass gray scale masks (see exemplary masks) were made for a variety of applications.

Among many fabrication techniques that have been developed to produce microoptical elements, HEBS-glass gray scale photolithography remains the most flexible, versitile, and accurate method. With a HEBS-glass gray scale mask, the fabrication of microoptical elements truly resembles the mass production of ICs. Any existing model of contact aligners, projection printers, and reduction steppers designed for IC fabrication can be used in gray scale photolithography, provided a true gray scale mask, i.e. a HEBS-glass mask, is utilized.

Laser Beam Direct Write (LDW) glass is another CMI patented glass product. Users of LDW Glass can fabricate their own Phase DOEs in LDW Glass, or fabricate their own gray scale photomasks in LDW glass.

Product Highlights		Technology Highlights
New Product! Sinusoidal MTF Target Designed for MTF testing, HEBS-glass Sinusoidal Target contains sinusoidal gratings 2 to 500 periods per mm, which are designed specifically for evaluating the MTF of imaging lenses and other optical components. Fabricated in HEBS-glass, this MTF Target having smooth and continuous OD profiles of sine waves, has no graniness and is less expensive than other commercially available products of much less quality. Now Available! CMI Calibration Plate HEBS5 Use a HEBS Glass calibration plate to perfect your gray scale photolithography process or to demonstrate the ability to utilize previous generations of IC equipment for the fabrication of a new class of cutting edge microoptical products. Patterns included on HEBS5: Resist thickness vs. OD calibration Tapered & via structures Microlens arrays (including 100% fill factor, array with each lens unique!) Sinusoidal transmittance gratings The Calibration Plate is a stock item; delivery in 1 to 2 weeks Now available: CMI Calibration Plates I85P+N and HEBS5N for negative resist & sol gel applications. Ultimate Quality CGHs Computer generated holograms (CGHs) with many phase levels are produced from HEBS Glass Gray Scale Photomasks in one photolithographic step; a gray pixel may range from 0.1 micron.		HEBS-glass Plates Offer True Gray Scale Photomasks and the Highest Gray Scale Resolution Possible! (see CMI Product Information No. 04-100) Read about how HEBS-glass gray scale photomasks offer the highest gray scale resolution when compared to alternative gray scale photomask techniques like halftone masks and photographic emulsion masks. Leading Edge Microlens Fabrication! Microlenses designed with Varied Degree of Compound Tilt HEBS-glass enables users to create new as well as traditional designs of microlens arrays: 100% fill factor, aspheric or spheric lenses, each lenslet in array can be unique! Exciting Applications! Use microlens arrays produced with HEBS-glass photomasks to improve efficiency of your: CMOS Imagers Fiber Optic Interconnects LCD Exciting technology! LDW Glass For micromachining of micro-optics in LDW glass using laser of any wavelength, ranging from visible to infrared, replaces use of excimer laser. LDW Glass Blanks are available in any size ranging from 1"x1" to 5"x5"